The potential of sonicated water in the cleaning processes of silicon wafers: Current challenges and future prospects



A. Podolian1), A. Nadtochiy1), O. Korotchenkov1), J. Schmid2), E. Kancsar2), V. Schlosser2)

  1. Faculty of Physics, Taras Shevchenko Kyiv National University, Kyiv 01601, Ukraine

  2. Department of Electronic Properties of Materials, University of Vienna, A-1090 Wien, Austria




ABSTRACT: -

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